Chemical
vapor deposition (CVD) is a chemical process used to produce high-purity,
high-performance solid materials. The process is often used in the semiconductor industry to produce thin films. In a typical CVD process, the wafer
(substrate)
is exposed to one or more volatile precursors,
which react and/or decompose on the substrate
surface to produce the desired deposit. Frequently, volatile by-products are
also produced, which are removed by gas flow through the reaction
chamber.
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