Physical Vapour Deposition

 

Thin-film vacuum coating method where the properties of the growing film are partly governed by the kinetic energy of the vapor species.

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Along with CVD, a group of surface treatments applied on tools and machine elements. In the area of machining and tooling PVD coatings are widely used to increase the life and productivity of production tools and therefore reducing manufacturing costs.

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Coating Method to deposit material on a surface. The most common methods are evaporation and sputtering. Evaporation is achieved in a vacuum chamber in which the evaporation is done thermally by heating the material above its melting point. Sputtering is done with a gas plasma. Ions from the plasma are accelerated towards the target surface releasing atoms from the target which condense on the sample surface (and everywhere else). The advantage of sputtering is a lower temperature compared to thermal evaporation.

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Vacuum-based coating procedure where the coating is formed from the condensation of a material vapor.

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Along with CVD, a group of surface treatments applied on tools and machine elements. In the area of machining and tooling PVD coatings are widely used to increase the life and productivity of production tools and therefore reducing manufacturing costs.

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Refer to this page:

Sputtering

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