Elements
used in performing photolithography experiments. Resists are polymer materials spun onto a substrate. When exposed to UV light, the polymer in the resist cross-links. When treated with
a solvent, the cross-linked portion of the resist dissolves, leaving the
desired pattern.
Elements
used in performing photolithography experiments. Resists are polymer materials spun onto a substrate. When exposed to UV light, the polymer in the resist cross-links. When treated with
a solvent, the cross-linked portion of the resist dissolves, leaving the
desired pattern.