Resist

 

Elements used in performing photolithography experiments. Resists are polymer materials spun onto a substrate. When exposed to UV light, the polymer in the resist cross-links. When treated with a solvent, the cross-linked portion of the resist dissolves, leaving the desired pattern.

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Elements used in performing photolithography experiments. Resists are polymer materials spun onto a substrate. When exposed to UV light, the polymer in the resist cross-links. When treated with a solvent, the cross-linked portion of the resist dissolves, leaving the desired pattern.

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A substance which protects a surface against specific chemical reactions. Commonly used to selectively protect a substrate against etching.

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A material or coating that can protect a surface from chemical reactions.

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